The Solaris 150 is a manual loading benchtop  
RTP system for R&D and pre-production.
The Solaris 150 can process up to 150mm
substrates at a temperature range from RT-
1300 degrees.

The unique temperature measurement system
of the Solaris requires virtually no calibration
for different wafer types and backside
emmissivity differences.

The Solaris uses a unique PID process
controller that ensures accurate temperature
stability and uniformity. The system can
accomodate four interlocked MFCs for gas
mixing and forming gas processing.

The Solaris is designed for silicon implant
annealing and monitoring and compound
semiconductor implant activation and ohmic


  • Easy to Use GUI Interface
  • Temperature Range RT-1300 degrees
  • Four MFC Capability
  • Zone Control
  • Top only or Bottom only Heating option
  • Thermocouple controlled
  • 21 Tungsten Halogen Lamps above and below
    the wafer in an Overlapping array
  • 1”-6” wafer capability
  • SiC coated susceptors for III-V processing
  • Quartz liners for BPSG/PSG processing
  • 15 month warranty
Copyright ©2004
Rapid Thermal Annealing, Heatpulse, Ag Associates, Rapid Thermal Processing, Rapid Thermal Anneal, RTP, RTA Annealsys Jipelic
 MPT 600s  wafer ID wafer marking, diffusion, oxidation, solar cell, cigs, photovoltaic, plasma etch, CVD, Semiconductor, four point
probe, UV Ozone, photoresist, GaAs, INP, GaN, silicon, flexible display, TFT, amorphous silicon, annel, ion implantation,
HeatpulseRapid Thermal Annealing Heatpulse Ag Associates Rapid Thermal Processing Rapid Thermal Anneal RTP RTA Annealsys
Jipelic  MPT 600s  wafer ID wafer marking
Solaris 150 Rapid Thermal Processing System